辉光放电清洗系统
仪器介绍
辉光放电清洗系统用于TEM栅网及支持膜的清洗和表面处理，如疏水的TEM碳膜经气体辉光放电处理后呈现亲水性的增加，使得极性悬浮液样品在碳膜上分散更均匀。
参数
| Plasma current | 30mA |
| Power | ≥30w, continuously adjustable |
| Vacuum range | 1.1-0.45mbar |
| Processing time | ≥600s |
| Processing delay time | ≥18h |
| Sample stage size | 75mm (diameter) * 25mm (height), continuously adjustable |
| Air inlets | 2 |